John Russell Bednarz

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Education & Credentials

University Attended:
Bucknell University, B.S., 2005
Law School Attended:
Syracuse University College of Law, J.D., 2008
Year of First Admission:
2008
Admission:
2008, Virginia; 2010, District of Columbia; 2014, Missouri; 2021, Kansas; registered to practice before U.S. Patent and Trademark Office
ISLN:
920664931

Areas of Practice (2)

  • Intellectual Property
  • Patents

Peer Reviews

4.9/5.0 (10 reviews)
Martindale-Hubbell® AV Preeminent Rating Badge
  • Legal Knowledge

    4.9/5.0
  • Analytical Capability

    4.8/5.0
  • Judgment

    4.8/5.0
  • Communication

    5.0/5.0
  • Legal Experience

    4.9/5.0
  • 5.0/5.0 Rated by a Attorney on 05/03/22 in Intellectual Property

    John is a fantastic and forward looking IP attorney. I’d recommend him to anyone looking for help to protect their IP.

  • 5.0/5.0 Rated by a Attorney on 04/15/22 in Patents

    John is able to effectively assess court opinions on patent issues (such as patent subject matter eligibility for software related inventions) to provide clear and concise guidance on the relevant issue to legal colleagues as well as business clients... Read more

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  • 5.0/5.0 Rated by a Attorney on 04/11/22 in Intellectual Property

  • 5.0/5.0 Rated by a Counsel on 04/06/22 in Intellectual Property

    John is an exceptional attorney! Aside from his in-depth knowledge in his field, he takes the time to really listen to his clients.

  • 5.0/5.0 Rated by a Attorney on 04/06/22 in Intellectual Property

  • 5.0/5.0 Rated by a Of Counsel on 04/05/22 in Patents

  • 5.0/5.0 Rated by a Attorney on 04/05/22 in Patents

    I've known John Bednarz for over 15 years and always known John to be an extremely hard worker in any task he takes on. John is very diligent and reliable.

  • 5.0/5.0 Rated by a Attorney on 04/05/22 in Patents

  • 4.6/5.0 Rated by a Associate on 04/05/22 in Patents

  • 4.2/5.0 Rated by a Associate on 04/05/22 in Intellectual Property

Peer reviews submitted prior to 2008 are not displayed.

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