Mr. Michael W. Russell, Ph.D.

no photo

Biography

Michael W. Russell, Ph.D. is a registered patent attorney with more than 20 years of experience. He focuses his practice on patent preparation and prosecution, patentability and risk assessment evaluations, portfolio management, and client counseling. He has prepared and prosecuted more than 200 issued U.S. patents across a wide range of technical disciplines, including semiconductor device processing, energy storage, materials processing, optics, sensors, filtration, catalysis, and paper products.

His previous experience includes work as a process development engineer developing chemical vapor deposition and integration processes for ferroelectric thin films for non-volatile memory applications. Michael was awarded a J. William Fulbright Fellowship at the National University of Rosario in Rosario, Argentina, and was also awarded a National Research Council Postdoctoral Fellowship at the Naval Research Laboratory in Washington, D.C. Michael is a former patent examiner with the United States Patent & Trademark Office and is listed as a co-inventor on 11 U.S. patents.

Universidad Nacional de Rosario, Rosario, República Argentina, 1996.

See more ›

Areas of Practice (2)

  • Intellectual Property & Technology
  • Patents and Innovation Strategies

Education & Credentials

University Attended:
Massachusetts Institute of Technology, S.B., 1988; Cornell University, M.S., Materials Science & Engineering, 1991; Cornell University, Ph.D., Materials Science & Engineering, 1994
Law School Attended:
Georgetown University Law Center, J.D., 2004
Year of First Admission:
2005
Admission:
2005, Virginia; 2006, District of Columbia; registered to practice before U.S. Patent and Trademark Office
Languages:
Spanish, Conversational
Reported Cases:
Experience: U.S. Patents (Co-Inventor): 7, 862, 857; 7, 705, 382; 7, 344, 589; 6, 984, 417 and 6, 316, 797 - 'Scalable Lead Zirconium Titanate (PZT) Thin Film Material and Deposition Method, and Ferroelectric Memory Device Structures Comprising such Thin Film Material'; 7, 012, 292 - 'Oxidative Top Electrode Deposition Process, and Microelectronic Device Structure'; 6, 699, 402 - 'Chemical Mechanical Polishing Compositions for CMP Removal of Iridium Thin Films'; 6, 395, 194 - 'Chemical Mechanical Polishing Compositions and Process for the CMP Removal of Iridium Thin Films Using Same'; 6, 346, 741 - 'Compositions and Structures for Chemical Mechanical Polishing of FeRAM Capacitors and Method of Fabricating FeRAM Capacitors Using Same'; 6, 184, 550 - 'Ternary Nitride-Carbide Barrier Layers'; 6, 100, 200 - 'Sputtering Process for the Conformal Deposition of a Metallization or Insulating Layer'; The above representations were handled by Mr. Russell prior to his joining Greenberg Traurig, LLP.; Government Experience: Patent Examiner, U.S. Patent and Trademark Office, 1994; In-House Experience: Intellectual Property Counsel, Corning, Inc., 2008-2015; Previous Experience: Process Development Engineer, ATMI, 1997-2000; Fellowships: Fulbright Fellow, University of Rosario, Argentina, 1996; National Research Council Postdoctoral Research Fellow, Naval Research Laboratory, 1994-1996
ISLN:
918638791

Payment Information

Credit Cards Accepted
American Express

Peer Reviews

This lawyer does not have peer reviews.

Client Reviews Write a Review

Location

Contact Mr. Michael W. Russell, Ph.D.

Contact Information:

www.gtlaw.com/en/professionals/r/russell-michael-w

Required Fields

Required Fields

Clear All Fields

By clicking on the "Submit" button, you agree to the Terms of Use, Supplemental Terms and Privacy Policy. You also consent to be contacted at the phone number you provided, including by autodials, text messages and/or pre-recorded calls, from Martindale and its affiliates and from or on behalf of attorneys you request or contact through this site. Consent is not a condition of purchase.

You should not send any sensitive or confidential information through this site. Emails sent through this site do not create an attorney-client relationship and may not be treated as privileged or confidential. The lawyer or law firm you are contacting is not required to, and may choose not to, accept you as a client. The Internet is not necessarily secure and emails sent though this site could be intercepted or read by third parties.