Noah R. Doolittle

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Education & Credentials

University Attended:
Boston College, B.A., 1997
Law School Attended:
University of Virginia, J.D., 2002
Year of First Admission:
2003
Admission:
2003, New York; U.S. Court of Appeals, Second Circuit; 2003, U.S. District Court, Northern, Southern, Eastern and Western Districts of New York
ISLN:
917476028

Responsibilities

  • Intellectual Property
  • Patent Application
  • Licensing
  • Corporate & Incorporation
  • Patent Application
  • Litigation

Peer Reviews

3.6/5.0 (1 review)
Peer Reviewed

  • Legal Knowledge

    4.0/5.0

  • Analytical Capability

    4.0/5.0

  • Judgment

    3.0/5.0

  • Communication

    4.0/5.0

  • Legal Experience

    3.0/5.0
Peer reviews submitted prior to 2008 are not displayed.

Client Reviews Write a Review

Location

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Noah R. Doolittle: at Eastman Kodak Company

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