Oona Jackson

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Education & Credentials

University Attended:
Rensselaer Polytechnic Institute, B.S., 1997
Law School Attended:
Albany Law School, J.D., 2000
Year of First Admission:
2000
Admission:
2000, New York; registered to practice before U.S. Patent and Trademark Office; Not admitted in New Jersey
ISLN:
917133280

Areas of Practice (2)

  • Chemical Intellectual Property
  • Patents

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Location

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  • Short Hills, NJ
    150 John F. Kennedy Parkway, CN 1000
    Short Hills, NJ 07078-0999